| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
Mechanical Behavior Related to Interface Physics IV
|
| Presentation Title |
Combinatorial ALD/PVD Deposition of Ti/Ti2AlC Metal/MAX Multilayered Nanolaminates and Investigating their Mechanical Properties and Deformation Mechanisms |
| Author(s) |
Skye Supakul, Sid Pathak, Garritt Tucker, Kevin Jacob |
| On-Site Speaker (Planned) |
Sid Pathak |
| Abstract Scope |
We investigate the deposition of Ti and Tin+1AlCn (n=1 or 2) using a combinatorial atomic layer deposition and physical vapor deposition system to synthesize metal/MAX phase multilayered nanolaminates (MMN) where the interface between metal and MAX phase layers are in direct competition with the internal interfaces within the MAX layers. We incorporate thin Al2O3 ALD layers to inhibit interlayer diffusion and report the successful deposition of MMN at temperatures as low as 400°C. This work investigates the mechanical properties of the MMN system with techniques such as nanoindentation and micropillar compression alongside deformed pillar compression TEM analysis to gain insight on the deformation mechanisms in the MMN. We discuss effects such as pillar geometry, layer orientation relative to load axis, and the strain rate sensitivity of the deposited system. Preliminary results show instability stresses as high as 8.1±0.2GPa in compression and shear being facilitated by the Al2O3 ALD layer/interface. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Thin Films and Interfaces, Mechanical Properties, Characterization |