| About this Abstract |
| Meeting |
2020 TMS Annual Meeting & Exhibition
|
| Symposium
|
Phase Stability, Phase Transformations, and Reactive Phase Formation in Electronic Materials XIX
|
| Presentation Title |
D-16: From Electric Current-induced Lattice Strain to Electromigration Occurrence: An In-situ Study |
| Author(s) |
Kuan-Hsueh Lin, Yu-chen Liu, Shih-kang Lin, Ching-Shun Ku, Shang-Jui Chiu |
| On-Site Speaker (Planned) |
Kuan-Hsueh Lin |
| Abstract Scope |
In 1976, Blech proposed the “critical product”, which is the product of current density and length, to be the criteria for the occurrence of electromigration (EM). EM causes atomic diffusion in metal strip and leads to device failure. The back stress model well explained this effect for strips up to 150 microns. However, we found in this study that it failed to predict EM occurrence in strips 5000 long or longer. The correlation between the lattice strain and electromigration (EM) occurrence and the mechanism governing will be elucidated in this poster. Al strips with different lengths ranging from microns to centimeters were stressed by electric current with in situ synchrotron X-ray diffraction characterization. The results showed that over certain critical lattice strain, hillocks formation on all Al strips in spite of lengths was observed under scanning electron microscopy. Further first principles calculations were conducted to explain this critical lattice strain. |
| Proceedings Inclusion? |
Planned: Supplemental Proceedings volume |