| Abstract Scope |
Modeling microstructure evolution involving both solution and stoichiometric phases is a long-standing challenge in phase-field method since the chemical potential of a stoichiometric compound only exists at a specific stoichiometric composition point. The usual practice of parabolic approximations to the chemical potential of a stoichiometric compound often leads to thermodynamic inconsistency, difficulty in parameterization, and numerical problems. Here we report a phase-field model for predicting microstructure evolution involving simultaneous solid stoichiometric and solution phases. It is generally applicable to a wide range of common processes such as precipitation of stoichiometric phases in alloys, crystallization of stoichiometric compounds, vapor-phase deposition of stoichiometric thin films or two-dimensional materials, oxidation of alloys, electrochemical deposition, interfacial reactions, etc. |