| About this Abstract |
| Meeting |
2021 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advanced Functional and Structural Thin Films and Coatings
|
| Presentation Title |
Atomic Layer Deposition & Atomic Layer Etching – An Overview of Selective Processes |
| Author(s) |
Oktay Gokce, Nuggehalli M. Ravindra, Samiha Hossain |
| On-Site Speaker (Planned) |
Samiha Hossain |
| Abstract Scope |
The continued evolution in nanoelectronics and nanophotonics has been made possible by the recent developments in Atomic Layer Deposition and Atomic Layer Etching. While uniform deposition of conformal films with controllable thickness is a key feature of Atomic Layer Deposition, Atomic Layer Etching offers the advantages of controlled removal of chemically modified areas. Various case studies of the applications of these technologies in dielectrics, metals and diffusion barriers will be discussed. Advantages, disadvantages, future directions and opportunities for further development will be highlighted. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Electronic Materials, Thin Films and Interfaces, Process Technology |