| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advances in Ceramic Materials and Processing
|
| Presentation Title |
Deep Removal of Arsenic from NiSO4 Solution Using Tungstate-Loaded D301 Resin |
| Author(s) |
Bing Liu, Meng-Xi Chen, Xi-Jun Zhang, Xing-yu Chen, Ai-liang Chen, Feng-long Sun |
| On-Site Speaker (Planned) |
Bing Liu |
| Abstract Scope |
Arsenic often dispersed in the production of electro-nickel. The dispersion of arsenic not only affect the quality of the nickel products but also poses risks to society and the environment. The low concentration of arsenic is difficult to separate from nickel sulfate solutions. This study is based on the theory that tungstate reacts with arsenate to form large-size arsenic-tungsten hetero-polyacids. And then D301 resins were used to absorb arsenic. The results showed that the adsorption has the best effect at pH value near 1.6 and temperature of 60℃. The concentration of arsenic in the nickel sulfate solution can be reduced to less than 1 mg/L. Kinetic studies showed that the adsorption process was controlled by the intraparticle diffusion model. The activation energy of adsorption is 7.083 KJ/mol. This study provides theoretical and technical support for the deep removal of arsenic from nickel sulfate solutions. |
| Proceedings Inclusion? |
Planned: |