| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advances in Surface Engineering VII
|
| Presentation Title |
Pattern Formation via the Oriented Growth of Au-Si Thin Films on Si(001) Substrate |
| Author(s) |
Rotem Zilberberg, Iryna Polishchuk, Lotan Portal, Silvia Milita, Giuseppe Falini, Alexander Katsman, Boaz Pokroy |
| On-Site Speaker (Planned) |
Rotem Zilberberg |
| Abstract Scope |
The fabrication of patterned surfaces is integral to various device manufacturing processes and requires precise manipulation of surface properties. This study (Zilberberg et al., Acta Mater, 2024) introduces a self-driven approach for patterning metal and semiconductor surfaces by solidifying eutectic Au-Si thin films on Si(001) substrates. The resulting pattern encompasses meticulously aligned Au-Si eutectic structures and Si islands attributed to the epitaxial growth of Si(001), Au(001), and Au(011) within the films. This was corroborated through electron diffraction and synchrotron radiation grazing-incidence wide-angle X-ray scattering (GIWAXS). We propose a 4:3 coincident site lattice model to elucidate the Au-Si interface, explaining the dominant (001)[110]Au||(001)[110]Si orientation relationship that minimizes the lattice mismatch to 0.2%. Another observed orientation relationship, (110)[001]Au||(001)[110]Si, entails a 6.3% mismatch in one direction, leading to contrasting elastic strains in the Au and Si lattices. This study underscores the practicality of substrate-oriented pattern formation, with potential applications in other phase-separated systems. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Surface Modification and Coatings, Solidification, Thin Films and Interfaces |