| About this Abstract |
| Meeting |
2024 TMS Annual Meeting & Exhibition
|
| Symposium
|
Phase Transformations and Microstructural Evolution
|
| Presentation Title |
Phase-field Simulation of Microstructure Development in Nonplanar Thin Films for Nanoelectronics Applications |
| Author(s) |
Hwanwook Lee, Jungin Park, Hassaan Ali, Yongwoo Kwon |
| On-Site Speaker (Planned) |
Yongwoo Kwon |
| Abstract Scope |
We present a phase-field model for microstructure formation in semiconductors, oxides, and metals thin films deposited on nonplanar substrates. The current nanoelectronic devices have high aspect ratio structures such as gate-all-around structures, DRAM capacitors, etc. The quality of thin films is very crucial for the device performance. Differential equations on gas transport, amorphous film formation, and crystallization followed by grain growth including stochastic nucleation are solved for a three-phase system comprising gas, film, and substrate from the early-stage film formation to the late-stage grain growth. The conformality and microstructure of nonmetal and metal films on nonplanar substrates were analyzed for different processing conditions. Usually, metals acquire polycrystalline microstructure during deposition due to the fast kinetics, whereas nonmetals crystallize during post-annealing following deposition due to the slow kinetics. It will be shown that our simulation successfully reproduces such experimental cases. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Modeling and Simulation, Electronic Materials, Thin Films and Interfaces |