| Abstract Scope |
Gas phase deposition processes like chemical vapor deposition (CVD) rely on molecular precursors with defined composition, thus enabling thin-film deposition with desired properties regarding coverage, crystallinity, composition, phase, as well as functionality. Precise process control is mandatory to achieve reliable and reproducible materials synthesis as well as to realize eco-friendly and sustainable manufacturing techniques. Therefore, both intrinsic as well as extrinsic measures should be exploited complementarily in order to achieve best process control. While the influence of electric fields has been investigated more thoroughly, reports of magnetic fields, especially in CVD remain scarce. Here we report the influence of external magnetic fields on the decomposition and phase and morphology evolution of transition metal oxides based on molecular single source precursors. By correlating depositions under varying deposition temperatures, field strengths and deposition times, magnetic field CVD (mfCVD) offers a versatile additional degree of freedom in optimizing gas phase deposition processes. |