| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advances in Ceramic Materials and Processing
|
| Presentation Title |
Gas-Phase MXene Synthesis via Dry Halide-Based Etching |
| Author(s) |
Benjamin Davis, Hyunho Kim, Yury Gogotsi |
| On-Site Speaker (Planned) |
Benjamin Davis |
| Abstract Scope |
Developing cost-effective methods of MXene synthesis is of the utmost importance for the industrial implementation of this rapidly growing family of 2D materials. The aqueous etching process typically used is time- and labor-intensive due to the many washing cycles needed to remove etchants from the MXene dispersion and later separate and collect delaminated MXene flakes. Aqueous etching with HF and HCl also results in an uncontrolled mixture of O, OH, F, and Cl surface terminations, which have a significant impact on the material properties. Recently, gas phase synthesis has been increasingly investigated as a potential alternative to traditional solution processing of MXenes. Gas-phase etching of MAX phases has the potential to save time, eliminate water waste, and produce MXenes with a single surface termination depending on the gas used. The present work investigates the ability of halogen-containing vapor to etch MAX phases and form MXenes. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Nanotechnology, Process Technology, Other |