About this Abstract |
Meeting |
2022 TMS Annual Meeting & Exhibition
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Symposium
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Recent Advances in Printed Electronics and Additive Manufacturing: 2D/3D Functional Materials, Fabrication Processes, and Emerging Applications
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Presentation Title |
On Depositing Chromium-nitride Patterns by Magnetic Guided Physical Vapor Deposition |
Author(s) |
Santiago Vargas, Diana Shirley Galeano, Carlos Eduardo Castano |
On-Site Speaker (Planned) |
Santiago Vargas |
Abstract Scope |
The magnetic field in a magnetron sputtering system has been modified to control de deposition flux and allow 3D printing of chromium-nitride structures on silicon wafers. This work compared direct current (MSDC) and high power impulse magnetron sputtering (HiPIMS) techniques to grow chromium-nitrogen structures while the magnetic strengths at the silicon substrate surface were selected to allow material pattering. The MSDC process was used to deposit a mound of chromium of about 2000 nm height in an area of 5 mm. Meanwhile, the HiPIMS formed a chromium nitride depression of about 50 nm depth in a diameter of 29 mm. Each structure was reviewed by profilometry, AFM, FIB-SEM, XRD, and XPS. Optical emission spectroscopy and the current-voltage waveforms during the processes were correlated with the resulting material structures. Other magnetic profiles were tested to give insights into the potential use of this technique as an additive manufacturing technique. |
Proceedings Inclusion? |
Planned: |
Keywords |
Surface Modification and Coatings, Process Technology, Additive Manufacturing |