| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
Mechanical Behavior Related to Interface Physics IV
|
| Presentation Title |
Novel Interface-Engineered Nanolaminated Al-X / AlOH Thin Films for Superior Mechanical Properties and Thermal Stability |
| Author(s) |
Hendrik Jansen, Amit Sharma, Barbara Putz, Marcus Hans, Jochen Schneider, Jakob Schwiedrzik, Thomas Edwards, Johann Michler |
| On-Site Speaker (Planned) |
Hendrik Jansen |
| Abstract Scope |
Recent advances enable deposition of interface-engineered multi-layered Al-X-Z / AlOH (25 / 1 nm; X = Ni, Si, Fe; Z = W, Mo) thin films by a combination of physical vapour and atomic layer deposition. These allow systematic evaluation of grain boundary engineering and the crystalline / amorphous interface on mechanical properties and thermal stability. Annealing at low homologous temperatures allows rather segregation enrichment at interfaces than grain growth. Thermal stability was investigated based on lateral grain growth– out-of-plane growth being limited by 1 nm AlOH interlayers. Mechanical testing by nanoindentation and micropillar compression at multiple strain rates allowed mechanical property analysis of the high-strength Al-X-Z / AlOH multilayer thin films with nanoindentation hardness of more than 5 GPa. Ultimately, high-resolution analysis by transmission electron microscopy and atom probe tomography allowed the enhanced properties to be linked to interface decoration and secondary phases that hinder dislocation and grain boundary movement. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Aluminum, Thin Films and Interfaces, Mechanical Properties |