| About this Abstract |
| Meeting |
MS&T24: Materials Science & Technology
|
| Symposium
|
High Entropy Materials: Concentrated Solid Solutions, Intermetallics, Ceramics, Functional Materials and Beyond V
|
| Presentation Title |
Optimizing Hardness of High-Entropy Boride Thin Films by Modulating the Bipolar HiPIMS Kick-Pulse |
| Author(s) |
Nathaniel S. McIlwaine, Nestor Marquez-Rios, Jon-Paul Maria |
| On-Site Speaker (Planned) |
Nathaniel S. McIlwaine |
| Abstract Scope |
Group 4-6B transition metal borides (HEBs) possess favorable refractory properties such as high hardness and high melting temperatures, which are useful for applications in advanced armors, cutting and metal-joining tools, and spacecraft thermal protection systems. HEBs contain within a single crystal structure a chemically disordered cation sub-lattice of ~4 or more different elements, which contribute to the advanced thermal and mechanical properties compared to binary transition metal borides. Physical vapor deposition of thin film high entropy borides through bipolar high-power impulse magnetron sputtering (HiPIMS) is an efficient synthesis process to explore this vast composition space. This research investigates the ability to improve the surface morphology and smoothness of high entropy HEB thin films through manipulation of the positive kick pulse during the HiPIMS operation cycle, which additionally has a positive effect of increasing the microhardness. |