| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
Chemistry and Physics of Interfaces
|
| Presentation Title |
Diffusion Behavior at the Interface of (110) Aluminum Substrates via Molecular Dynamics Simulation |
| Author(s) |
Armin Shashaani, Panthea Sepehrband |
| On-Site Speaker (Planned) |
Armin Shashaani |
| Abstract Scope |
As two contaminant-free metal surfaces come sufficiently close, atomic layers from both surfaces stretch out and form a bond, creating an interface similar to a grain boundary. Following contact formation, the extent of diffusion significantly influences the strength and depth of the bond. This study uses molecular dynamics to examine self-diffusion behavior at the interface formed between (110) aluminum substrates at various twist angles. Analysis focuses on the interface by identifying the interface thickness and monitoring atomic trajectories within that thickness. Enhanced diffusion near the interface is detected and the interface thickness is found to be temperature-dependent. As the twist angle increases, the pre-exponential factor of diffusion increases, while the activation energy decreases. This is likely due to the increased excess volume at the interface, which facilitates atomic movement. These findings are significant for enhancing bonding characteristics in a range of technological applications that rely on solid-state joining processes. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Computational Materials Science & Engineering, Modeling and Simulation, Thin Films and Interfaces |