| About this Abstract |
| Meeting |
MS&T24: Materials Science & Technology
|
| Symposium
|
16th Symposium on Green and Sustainable Technologies for Materials Manufacturing and Processing
|
| Presentation Title |
Deposition Rates and Annealing Effects on the Growth of Nb Thin Film on Cu Substrate: Molecular Dynamic Simulation |
| Author(s) |
Lablali Mohammed, Mes-Adi Hassan, Mazroui M'Hammed |
| On-Site Speaker (Planned) |
Lablali Mohammed |
| Abstract Scope |
In our work, we perform the deposition of Nb atoms on Cu substrates using the molecular dynamics simulation combined with the embedded atom method to describe the interaction between different atoms. We investigated the impact of varying deposition rates and thermal annealing processes on the microstructural, morphological, and mechanical characteristics of the deposited Nb film. Our findings reveal that Nb atom growth on the Cu substrate occurs in island mode, accompanied by the presence of nucleation phenomena during growth. On the other hand, mixing behavior was observed at the interface between the film and the substrate, where Nb penetration is initially limited to the first Cu layer, whereas Cu atoms diffuse until reaching the third layer in the Nb film. Furthermore, Nb exhibits a BCC structure, and annealing further amplifies these percentages. Deposition at different rates leads to distinct levels of compressive stress. |