About this Abstract |
Meeting |
TMS Specialty Congress 2024
|
Symposium
|
2nd World Congress on Artificial Intelligence in Materials & Manufacturing (AIM 2024)
|
Presentation Title |
Patch-wise Canonical Correlation Analysis in SEM: Advancing 3D Serial Sectioning Image Registration |
Author(s) |
Zachary Varley, Marc De Graef, Gregory Rohrer, Megna Shah, Michael Uchic |
On-Site Speaker (Planned) |
Zachary Varley |
Abstract Scope |
While 3D serial sectioning experiments in a scanning electron microscope (SEM) with electron backscatter diffraction (EBSD) provide rich microstructure information, they present significant data collation challenges. Typically, electron backscatter diffraction (EBSD) maps are aligned with corresponding backscatter electron micrographs to eliminate distortions from any experimental factors or viewpoint changes. Existing registration metrics such as mutual information can fail to result in well aligned volumetric data, especially when applied to as-built 3D printed samples. Barrowing from recent advances in medical image registration, we propose using Patch-wise Canonical Correlation Analysis (PCCA) in conjunction with a pretrained Convolutional Neural Networks (CNN). Unlike mutual information, PCCA leverages local structure within images, conferring better accuracy at increased computational burden. This additional cost can be alleviated by approximating the PCCA metric with a CNN. This advancement demonstrates remains performant in challenging registration scenarios and shows potential for broader application across SEM imaging modalities. |
Proceedings Inclusion? |
Definite: Other |