| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
Refractory Metals 2025
|
| Presentation Title |
Low temperature oxidation behavior of pure niobium and C103 niobium alloy |
| Author(s) |
Ching-Chien Chen, Xiaoling Shen, Dina Khattab, Paul R. Mort, Jeffrey P. Youngblood, Michael S. Titus |
| On-Site Speaker (Planned) |
Ching-Chien Chen |
| Abstract Scope |
The properties of niobium and its alloys are profoundly influenced by oxidation, which occurs not only at high temperatures under operational conditions but also during lower temperature manufacturing processes such as additive manufacturing, wrought processing, and other low temperature thermal transients. This study systematically investigates the oxidation behavior of pure niobium and the C103 alloy (10 at. % Hf and 1 at. % Ti) over a temperature range of 300°C to 400°C for oxidation times below 10 hours. The surfaces and its chemistry were characterized by transmission electron microscopy, oxygen analyzer, and Raman spectroscopy, revealing nanometer-scale amorphous oxide layers. Unlike high-temperature oxidation, no hafnium oxide precipitates were observed in C103 due to slow diffusion. Despite C103 exhibiting a thinner oxide layer because of the higher density of hafnium oxide, oxygen uptake was comparable to pure niobium. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Characterization, High-Temperature Materials, Other |