| About this Abstract |
| Meeting |
2025 TMS Annual Meeting & Exhibition
|
| Symposium
|
2025 Technical Division Student Poster Contest
|
| Presentation Title |
SPG-85: Self-Limiting Electrospray with High-Flow Rate Emitters and Defect Elimination Using Secondary Bias |
| Author(s) |
Rahman Pejman, Ayman Rouf, Shubin Xie, Jonathon Singer |
| On-Site Speaker (Planned) |
Rahman Pejman |
| Abstract Scope |
Electrospray deposition (ESD) is a versatile technique for uniform thin-film coatings using monodisperse micro/nanodroplets. In the self-limiting ESD (SLED) regime, which occurs when polymers are deposited as glasses, surface charge accumulation restricts film growth, redistributing depositing to uncoated parts of the sample. SLED enables the coating of complex 3D structures but is typically constrained to low flow rates. This study investigates enhancing flow rates and while retaining uniformity. We compare a commercial aperture-based emitter that allows for rates up to 100 ml/h to a 3D-printed microfluidic emitter capable of 65 ml/h. Results reveal that increased solvent vapor and droplet size weakens the SLED effect but accelerates deposition. The net result is uncoated zones between emitter plumes. These dead spots can be minimized by applying a bias voltage to the target and target rotation. This approach highlights the potential for scalable, rapid, and precise 3D coatings using high-flow SLED techniques. |
| Proceedings Inclusion? |
Undecided |
| Keywords |
Additive Manufacturing, Polymers, Surface Modification and Coatings |